Ratkaistu EU-hankinta

Si & Silicon oxide CMP

VTT Technical Research Centre of Finland Ltd · Uusimaa

Perustiedot

Tarjousten määräaika
ma 19.6.2023 klo 9.00 (päättynyt)
Hankkija
VTT Technical Research Centre of Finland Ltd, Y-tunnus 2647375-4
Toteutuspaikka
Uusimaa (FI1B1)
Hankintalaji
Tavarahankinta
Menettely
EU-hankinta
Ilmoituksen tyyppi
Hankintailmoitus
Arvioitu kokonaisarvo
800 000 € (alv 0 %)
Pääasiallinen CPV
42900000 Erilaiset yleis- ja erikoiskoneet
Julkaistu
19.5.2023

Ilmoituksen teksti

Alkuperäinen teksti Hilmasta, muuttamattomana
The object of the tender is an Automatic Chemical Mechanical Polisher (later also “Equipment”), for the polishing of typical films and substrates like Si, Si-compounds, Ge and other typical wafers used in semiconductor industry of 100, 150 and 200mm diameter. The equipment shall be designed with at least two polishing platens with integrated in-situ capable pad conditioning systems, an end-point detection on at least one platen, multi-zone carrier heads for all wafer diameters and a slurry feed system for at least 3 slurries. In addition, a supporting wafer cleaning system either integrated or stand-alone is an optional part of the tendering procedure. The object of the tender process is described in more detail in the invitation to tender documents.

Erän kuvaus

The object of the tender is an Automatic Chemical Mechanical Polisher (later also “Equipment”), for the polishing of typical films and substrates like Si, Si-compounds, Ge and other typical wafers used in semiconductor industry of 100, 150 and 200mm diameter. The equipment shall be designed with at least two polishing platens with integrated in-situ capable pad conditioning systems, an end-point detection on at least one platen, multi-zone carrier heads for all wafer diameters and a slurry feed system for at least 3 slurries. In addition, a supporting wafer cleaning system either integrated or stand-alone is an optional part of the tendering procedure. The tool must comply with cleanroom equipment standard safety and contamination requirements. The tool specs are based on the following factors:  - Polish finishing quality - Wafer handling without errors and wafer loss - End-point detection for layer clearing - Achievable polishing rate profile The pricing of the equipment will consist of the main price for the minimum tool requirements (“total price of the equipment”) and a separate price for the optional parts, features and efforts. The optional goods offered are not included in the total price of the equipment. The object of the tender process is described in more detail in the invitation to tender documents.

Lisätiedot

Additional information regarding the section II.2.7) above: Agreement shall enter into force on the latest date of signature by the Parties and shall be in force until the Equipment has been delivered and accepted, the user training has been held and agreed payment paid, excluding clauses which legal effects are meant to survive the termination or expiration of the Agreement.

Hankinnan vaiheet

  1. Hankintailmoitustämä ilmoitus

    Tarjouspyyntö julkaistiin, määräaika 19.6.2023 klo 9.00.

  2. Jälki-ilmoitus

    Voittaja: S3-Alliance Ltd.

Lähde: Hilma (hankintailmoitukset.fi)

Ilmoitus 2023-128903

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