Electron beam lithography system (EBL)

Tampere University Foundation sr is inviting tenders for 'Electron beam lithography system', hereinafter 'EBL'.

Dedicated electron beam lithography tool for fabrication of photonic samples. Contracting authority has a need for high precision and productive tool which would be extremely useful in preparation of photonic structures, such as waveguides, gratings and meta-plasmonic structures. Budget is 1 280 000 € (total price covering all mandatory requirements) and tenders over it are rejected. Procurement is funded directly by Business Finland - and indirectly by EU RRF Regulation (EU 2021/241 Recovery and Resilience Facility). PHASING OF THE CALL: Tender is divided in two parts: - In phase one, accepted quotations are graded and up to 60 points are rewarded from quotation and related paperwork. - In second phase, remaining (up to 40 points) are awarded to tenderers based on evaluation tests done with demo system provided by tenderer. Only two (2) tenderers who have achieved most points in phase one are to be invited to phase 2. If tenderer is not within best two (2) in phase 2 but is within five (5) points from 2nd place this tenderer is invited to phase 2. If tenderers are evaluated to have equal merit in some evaluation criteria all tenderers receive same number of points as they would in case where only one tenderer would meet criteria. For example, in point category where winner receives 10 points, all equal winners get 10 points. TAU reserves right to visit tenderers after closing of tender to evaluate ease of use and other aspects relevant for selection. Tenderer must have demo system prepared for this within one month from closing of tender.